Product Line

Sputtering Target

HfO2 target

Product Name : HfO2 target

Description

We have rich experience in manufacturing Sputtering Target such as Diamond Dresser, Target Bonding, Wafers, etc.


HfO2 target
Purity: 99.99%
Pervious range: 230-7,000 nm
Density: 9.68g/cm3
Refraction: 2.00/550 nm    
Melting point: 2,774°C
Application: optical thin films .UV film. Mirror
Customization specification
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