Product Name : HfO2 target Description We have rich experience in manufacturing Sputtering Target such as Diamond Dresser, Target Bonding, Wafers, etc. HfO2 target Purity: 99.99% Pervious range: 230-7,000 nm Density: 9.68g/cm3 Refraction: 2.00/550 nm Melting point: 2,774°C Application: optical thin films .UV film. Mirror Customization specification Inquire Now